Thickness of SiO2 thin film on silicon wafer measured by dispersive white-light spectral interferometry

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Title: Thickness of SiO2 thin film on silicon wafer measured by dispersive white-light spectral interferometry
Author: Hlubina, Petr
Ciprian, Dalibor
Luňáček, Jiří
Lesňák, Michal
Date issue: 2006
Citation: Applied physics. B, Lasers and optics. 2006, vol. 84, no. 3, p. 511-516.
URI: http://hdl.handle.net/10084/56446
ISSN: 0946-2171
1432-0649
DOI: 10.1007/s00340-006-2282-2
URI: http://dx.doi.org/10.1007/s00340-006-2282-2
Type: article
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