Critical dimension of biperiodic gratings determined by spectral ellipsometry and Mueller matrix polarimetry

DSpace/Manakin Repository

aaK citaci nebo jako odkaz na tento záznam použijte identifikátor: http://hdl.handle.net/10084/66072

Show simple item record


dc.contributor.author Foldyna, Martin
dc.contributor.author De Martino, Antonello
dc.contributor.author Garcia-Caurel, Enric
dc.contributor.author Ossikovski, Razvigor
dc.contributor.author Licitra, Christophe
dc.contributor.author Bertin, François
dc.contributor.author Postava, Kamil
dc.contributor.author Drevillon, Bernard
dc.date.accessioned 2008-07-25T12:42:28Z
dc.date.available 2008-07-25T12:42:28Z
dc.date.issued 2008
dc.identifier.citation European physical journal - applied physics. 2008, vol. 42, issue 3, p. 351-359. en
dc.identifier.issn 1286-0042
dc.identifier.issn 1286-0050
dc.identifier.uri http://hdl.handle.net/10084/66072
dc.description.abstract We characterized two samples consisting of photoresist layers on silicon with square arrays of square holes by spectroscopic ellipsometry (SE) and Mueller matrix polarimetry (MMP). Hole lateral dimensions and depths were determined by fitting either SE data taken in conventional planar geometry or MMP data in general conical diffraction configurations. A method for objective determination of the optimal measurement conditions based on sensitivity and parameter correlations is presented. When applied to MMP, this approach showed that for one of the samples the optimal incidence angle was 45°, much below the widely used 70° value. The robustness of the dimensional characterisation based on MMP is demonstrated by the high stability of the results provided by separated fits of the data taken at different azimuthal angles. en
dc.language.iso en en
dc.publisher EDP Sciences en
dc.relation.ispartofseries European physical journal - applied physics en
dc.relation.uri http://dx.doi.org/10.1051/epjap:2008089 en
dc.subject gratings en
dc.subject polarimeters and ellipsometers en
dc.subject polarimetry en
dc.subject metrological applications en
dc.subject optical frequency synthesizers for precision spectroscopy en
dc.title Critical dimension of biperiodic gratings determined by spectral ellipsometry and Mueller matrix polarimetry en
dc.type article en
dc.identifier.location Ve fondu ÚK en
dc.identifier.doi 10.1051/epjap:2008089
dc.identifier.wos 000257337500025

Files in this item

Files Size Format View

There are no files associated with this item.

This item appears in the following Collection(s)

Show simple item record

Search DSpace


Advanced Search

Navigation

Browse

My Account

Statistics