• High-frequency EMI noise suppression by polymer-based composite magnetic materials 

  Dosoudil, R.; Franek, J.; Ušáková, M.; Olah, V.; Sláma, J. (Advances in electrical and electronic engineering. 2008, vol. 7, no. 1, 2, p. 406-409.)

• Electromagnetic properties of selected hexaferrites 

  Grusková, A.; Sláma, J.; González, A.; Ďurman, V.; Ušáková, M.; Jančárik, V.; Šoka, M. (Advances in electrical and electronic engineering. 2008, vol. 7, no. 1, 2, p. 401-405.)

• New nanocrystalline materials for power electronics applications 

  Ušák, E.; Švec, P.; Kuchta, J.; Bydžovský, J. (Advances in electrical and electronic engineering. 2008, vol. 7, no. 1, 2, p. 398-400.)

• Magnetic spectra analysis of dielectrics 

  Sláma, J.; Olah, V.; Grusková, A.; Jančárik, V.; Hudec, I.; Dosoudil, R.; Široký, P.; Šoka, M. (Advances in electrical and electronic engineering. 2008, vol. 7, no. 1, 2, p. 393-397.)

• The resistance of breakdown in transformer oil 

  Kúdelčík, Jozef (Advances in electrical and electronic engineering. 2008, vol. 7, no. 1, 2, p. 389-392.)

• Simulation of electrical parameters for Ru/Ta2O5/SiO2/Si(p) high-k MOS structure 

  Racko, J.; Harmatha, L.; Breza, J.; Benko, P.; Donoval, D. (Advances in electrical and electronic engineering. 2008, vol. 7, no. 1, 2, p. 385-388.)

• Sputtered of ZnO:Al thin films for application in photovoltaic solar cells 

  Flickyngerová, S.; Řeháková, A.; Tvarožek, V.; Novotný, I. (Advances in electrical and electronic engineering. 2008, vol. 7, no. 1, 2, p. 382-384.)

• Ofstatistical and fractal properties of semiconductor surface roughness 

  Jurečka, Stanislav; Jurečková, Mária; Kobayashi, Hikaru; Takahashi, Masao; Madani, Mohammad; Pinčík, Emil (Advances in electrical and electronic engineering. 2008, vol. 7, no. 1, 2, p. 377-381.)

• Modeling of A-DLTS spectra of MOS structures 

  Hockicko, Peter; Sidor, Peter; Bury, Peter; Kúdelčík, Jozef; Jamnický, I. (Advances in electrical and electronic engineering. 2008, vol. 7, no. 1, 2, p. 373-376.)

• On nanometer ordering in thin amorphous hydrogenated silicon 

  Müllerová, Jarmila; Vavruňková, Veronika; Šutta, P. (Advances in electrical and electronic engineering. 2008, vol. 7, no. 1, 2, p. 369-372.)

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