Microstructure related characterization of a-Si:H thin films PECVD deposited under varied hydrogen dilution

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Title: Microstructure related characterization of a-Si:H thin films PECVD deposited under varied hydrogen dilution
Author: Vavruňková, Veronika
Müllerová, Jarmila
Šutta, Pavel
Date issue: 2007
Citation: Advances in electrical and electronic engineering. 2007, vol. 6, no. 3, p. 108-111.
URI: http://hdl.handle.net/10084/83877
URI: http://advances.utc.sk/index.php/AEEE
ISSN: 1336-1376
Type: article
Document version: publishedVersion
Access rights: openAccess
Rights: Creative Commons Attribution 3.0 Unported (CC BY 3.0)
© Žilinská univerzita v Žiline. Elektrotechnická fakulta
Rights: http://creativecommons.org/licenses/by/3.0/

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