| dc.contributor.author | Postava, Kamil | |
| dc.contributor.author | Yamaguchi, Tomuo | |
| dc.contributor.author | Nakano, T. | |
| dc.date.accessioned | 2007-07-02T09:25:28Z | |
| dc.date.available | 2007-07-02T09:25:28Z | |
| dc.date.issued | 2001 | |
| dc.identifier.citation | Optics Express. 2001, vol. 9, issue 3, p. 141-151. | en |
| dc.identifier.issn | 1094-4087 | |
| dc.identifier.uri | http://hdl.handle.net/10084/60829 | |
| dc.format.extent | 333159 bytes | |
| dc.format.mimetype | application/pdf | |
| dc.language.iso | en | en |
| dc.publisher | Optical Society of America | en |
| dc.relation.ispartofseries | Optics Express | en |
| dc.relation.uri | https://doi.org/10.1364/OE.9.000141 | |
| dc.rights | This paper was published in Optics Express and is made available as an electronic reprint with the permission of OSA. The paper can be found at the following URL on the OSA website: http://dx.doi.org/10.1364/OE.9.000141. Systematic or multiple reproduction or distribution to multiple locations via electronic or other means is prohibited and is subject to penalties under law. | |
| dc.rights | © 2001 Optical Society of America | |
| dc.subject | materials | en |
| dc.subject | organic materials | en |
| dc.subject | Spectroscopy | en |
| dc.subject | thin films | en |
| dc.subject | optical properties | en |
| dc.subject | physical optics | en |
| dc.subject | ellipsometry and polarimetry | en |
| dc.title | Characterization of organic low-dielectric-constant materials using optical spectroscopy | en |
| dc.type | article | en |
| dc.identifier.location | Není ve fondu ÚK | en |
| dc.description.abstract-en | The dielectric function spectra of low dielectric constant (low-k) materials have been determined using high-precision four-zone null spectroscopic ellipsometry, near-normal incidence reflection spectrometry and Fourier transform infrared transmission spectroscopy. The optical functions over a wide spectral range from 0.03 to 5.4 eV (230 nm to 40.5 µm wavelength region) have been evaluated for representative low-k materials used in the semiconductor industry for interlayer dielectrics: (1) FLARE -- organic spin-on polymer, and (2) HOSP -- spin-on hybrid organic-siloxane polymer from the Honeywell Electronic Materials Company. | en |
| dc.identifier.doi | 10.1364/OE.9.000141 | |
| dc.rights.access | openAccess | |
| dc.type.version | publishedVersion | |
| dc.identifier.wos | 000170203300004 | |