Facile production of ultra-fine silicon nanoparticles

Tokarska, Klaudia; Shi, Qitao; Otulakowski, Łukasz; Wróbel, Paweł; Ta, Huy Quang; Kurtyka, Przemysław; Kordyka, Aleksandra; Siwy, Mariola; Vasylieva, Margaryta; Foryś, Aleksander; Trzebicka, Barbara; Bachmatiuk, Alicja; Rümmeli, Mark H.

dc.contributor.author	Tokarska, Klaudia
dc.contributor.author	Shi, Qitao
dc.contributor.author	Otulakowski, Łukasz
dc.contributor.author	Wróbel, Paweł
dc.contributor.author	Ta, Huy Quang
dc.contributor.author	Kurtyka, Przemysław
dc.contributor.author	Kordyka, Aleksandra
dc.contributor.author	Siwy, Mariola
dc.contributor.author	Vasylieva, Margaryta
dc.contributor.author	Foryś, Aleksander
dc.contributor.author	Trzebicka, Barbara
dc.contributor.author	Bachmatiuk, Alicja
dc.contributor.author	Rümmeli, Mark H.
dc.date.accessioned	2020-11-10T08:57:20Z
dc.date.available	2020-11-10T08:57:20Z
dc.date.issued	2020
dc.identifier.citation	Royal Society Open Science. 2020, vol. 7, issue 9, art. no. 200736.	cs
dc.identifier.issn	2054-5703
dc.identifier.uri	http://hdl.handle.net/10084/142393
dc.description.abstract	A facile procedure for the synthesis of ultra-fine silicon nanoparticles without the need for a Schlenk vacuum line is presented. The process consists of the production of a (HSiO1.5)(n) sol-gel precursor based on the polycondensation of low-cost trichlorosilane (HSiCl3), followed by its annealing and etching. The obtained materials were thoroughly characterized after each preparation step by electron microscopy, Fourier transform and Raman spectroscopy, X-ray dispersion spectroscopy, diffraction methods and photoluminescence spectroscopy. The data confirm the formation of ultra-fine silicon nanoparticles with controllable average diameters between 1 and 5 nm depending on the etching time.	cs
dc.language.iso	en	cs
dc.publisher	Royal Society	cs
dc.relation.ispartofseries	Royal Society Open Science	cs
dc.relation.uri	http://doi.org/10.1098/rsos.200736	cs
dc.rights	© 2020 The Authors. Published by the Royal Society under the terms of the Creative Commons Attribution License, which permits unrestricted use, provided the original author and source are credited.	cs
dc.rights.uri	http://creativecommons.org/licenses/by/4.0/	cs
dc.subject	ultra-fine silicon	cs
dc.subject	Si nanoparticle	cs
dc.subject	trichlorosilane	cs
dc.subject	synthesis	cs
dc.title	Facile production of ultra-fine silicon nanoparticles	cs
dc.type	article	cs
dc.identifier.doi	10.1098/rsos.200736
dc.rights.access	openAccess	cs
dc.type.version	publishedVersion	cs
dc.type.status	Peer-reviewed	cs
dc.description.source	Web of Science	cs
dc.description.volume	7	cs
dc.description.issue	9	cs
dc.description.firstpage	art. no. 200736	cs
dc.identifier.wos	000574547100001

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© 2020 The Authors. Published by the Royal Society under the terms of the Creative Commons Attribution License, which permits unrestricted use, provided the original author and source are credited.

Except where otherwise noted, this item's license is described as © 2020 The Authors. Published by the Royal Society under the terms of the Creative Commons Attribution License, which permits unrestricted use, provided the original author and source are credited.