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dc.contributor.authorHlubina, Petr
dc.contributor.authorCiprian, Dalibor
dc.contributor.authorLuňáček, Jiří
dc.contributor.authorLesňák, Michal
dc.date.accessioned2007-06-22T09:15:53Z
dc.date.available2007-06-22T09:15:53Z
dc.date.issued2006
dc.identifier.citationOptics Express. 2006, vol. 14, issue 17, p. 7678-7685.en
dc.identifier.issn1094-4087
dc.identifier.urihttp://hdl.handle.net/10084/60633
dc.format.extent142607 bytes
dc.format.mimetypeapplication/pdf
dc.language.isoenen
dc.publisherOptical Society of Americaen
dc.relation.ispartofseriesOptics Expressen
dc.relation.urihttp://dx.doi.org/10.1364/OE.14.007678en
dc.rights© 2006 Optical Society of America
dc.rightsThis paper was published in Optics Express and is made available as an electronic reprint with the permission of OSA. The paper can be found at the following URL on the OSA website: http://dx.doi.org/10.1364/OE.14.007678. Systematic or multiple reproduction or distribution to multiple locations via electronic or other means is prohibited and is subject to penalties under law.
dc.subjectmeasurementen
dc.subjectinstrumentationen
dc.subjectand metrologyen
dc.subjectinterferometryen
dc.subjectphase measurementen
dc.subjectoptics at surfacesen
dc.subjectthin filmsen
dc.titleDispersive white-light spectral interferometry with absolute phase retrieval to measure thin filmen
dc.typearticleen
dc.identifier.locationNení ve fondu ÚKen
dc.description.abstract-enWe present a white-light spectral interferometric technique for measuring the absolute spectral optical path difference (OPD) between the beams in a slightly dispersive Michelson interferometer with a thin-film structure as a mirror. We record two spectral interferograms to obtain the spectral interference signal and retrieve from it the spectral phase, which includes the effect of a cube beam splitter and the phase change on reflection from the thin-film structure. Knowing the effective thickness and dispersion of the beam splitter made of BK7 optical glass, we use a simple procedure to determine both the absolute spectral phase difference and OPD. The spectral OPD is measured for a uniform SiO2 thin film on a silicon wafer and is fitted to the theoretical spectral OPD to obtain the thin-film thickness. The theoretical spectral OPD is determined provided that the optical constants of the thin-film structure are known. We measure also the nonlinear-like spectral phase and fit it to the theoretical values in order to obtain the thin-film thickness.en
dc.identifier.doi10.1364/OE.14.007678
dc.rights.accessopenAccess
dc.type.versionpublishedVersion
dc.identifier.wos000240164100024


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