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dc.contributor.authorPostava, Kamil
dc.contributor.authorSueki, H.
dc.contributor.authorAoyama, Mitsuru
dc.contributor.authorYamaguchi, Tomuo
dc.contributor.authorIno, Ch.
dc.contributor.authorIgasaki, Y.
dc.contributor.authorHorie, Masahiro
dc.date.accessioned2007-06-29T13:26:12Z
dc.date.available2007-06-29T13:26:12Z
dc.date.issued2000
dc.identifier.citationJournal of Applied Physics. 2000, vol. 87, issue 11, p. 7820-7824.en
dc.identifier.issn0021-8979
dc.identifier.issn1089-7550
dc.identifier.urihttp://hdl.handle.net/10084/60825
dc.language.isoenen
dc.publisherAmerican Institute of Physicsen
dc.relation.ispartofseriesJournal of Applied Physicsen
dc.relation.urihttp://dx.doi.org/10.1063/1.373461en
dc.titleSpectroscopic ellipsometry of epitaxial ZnO layer on sapphire substrateen
dc.typearticleen
dc.identifier.locationNení ve fondu ÚKen
dc.description.abstract-enOptical properties of epitaxial ZnO layers have been studied in the spectral region from 1.5 to 5.4 eV using four-zone null spectroscopic ellipsometry. An existing model dielectric function based on excitonic structure near direct band gap has been improved by including a high-energy absorption term. Surface layer, corresponding to the surface roughness, was found to be essential to fit the spectroellipsometric data obtained. Two kinds of samples have been studied: ZnO layers prepared on (0001) and (110)-oriented sapphire substrates. The surfaces of the first ones were found to be more rough.en
dc.identifier.doi10.1063/1.373461
dc.identifier.wos000087067400033


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