The effect of silicon substrate on thickness of SiO2 thin film analysed by spectral reflectometry and interferometry

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Title: The effect of silicon substrate on thickness of SiO2 thin film analysed by spectral reflectometry and interferometry
Author: Hlubina, Petr
Luňáček, Jiří
Ciprian, Dalibor
Date issue: 2009
Citation: Applied physics, B. Lasers and optics. 2009, vol. 95, no. 2, p. 795-799.
URI: http://hdl.handle.net/10084/71303
ISSN: 0946-2171
1432-0649
DOI: 10.1007/s00340-009-3418-y
URI: http://dx.doi.org/10.1007/s00340-009-3418-y
Type: Article
Document version: submittedVersion
Access rights: openAccess Fulltext Request
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