Příprava 1D fotonického krystalu magnetronovým naprašováním

Abstract

This final work is focused on preparation of optical thin films based on 1D photonic crystals. This photonic crsytals was prepared from Ta2O5 and SiO2 materials by magnetron sputtering. In the fist phase, deposition parameters was optimalised, mainly the oxygen and argon flows, thus to achieve enough high deposition rate and at the samoe time good optical properties. By a combination of transmission and elipsometric data and with use of optical models of dielectric function we were able to define optical constants of Ta2O5 and SiO2 materials with angle of incidendy 45° and wavelength of 800nm, with the goal of reflection of high potent laser beams. In the end, the dielectric mirror was prepared.