Potentiostatic electrodeposition of Cu2O under light and dark for photoelectrochemical hydrogen generation applications

dc.contributor.authorMikolášek, Miroslav
dc.contributor.authorOndrejka, Peter
dc.contributor.authorChymo, Filip
dc.contributor.authorNovák, Patrik
dc.contributor.authorHarmatha, Ladislav
dc.contributor.authorŘeháček, Vlastimil
dc.contributor.authorHotový, Ivan
dc.date.accessioned2018-11-07T08:07:12Z
dc.date.available2018-11-07T08:07:12Z
dc.date.issued2018
dc.description.abstractPotentiostatic electrodeposition conducted at various deposition voltages from lactate-stabilized copper sulfate electrolyte was used for preparation of Cu2O layers for Photoelectrochemical (PEC) production of hydrogen. A novel approach based on an application of light during the electrodeposition is utilized to suppress the potential drop in the Cu2O layer during the potentiostatic deposition. Structures prepared under dark and light on an Ag substrate are analyzed by X-Ray Diffraction analysis (XRD), Scanning Electron Microscopy (SEM) and Linear Sweep Voltammetry (LSV). It was shown that the application of light increases the deposition rate due to the contribution of the photogenerated carriers. The deposition voltage affects the photoresponse of light deposited structures but causes only a negligible change in dark deposited structures. The light deposited samples exhibited a higher photoresponse for all deposition voltages. The presented study suggests the light potentiostatic electrodeposition as an attractive approach for the preparation of Cu2O structures for cheap and efficient photoelectrochemical water splitting applications.cs
dc.format.extent766628 bytes
dc.format.mimetypeapplication/pdf
dc.identifier.citationAdvances in electrical and electronic engineering. 2018, vol. 16, no. 3, p. 367-373 : ill.cs
dc.identifier.doi10.15598/aeee.v16i3.2749
dc.identifier.issn1336-1376
dc.identifier.issn1804-3119
dc.identifier.urihttp://hdl.handle.net/10084/132827
dc.language.isoencs
dc.publisherVysoká škola báňská - Technická univerzita Ostravacs
dc.relation.ispartofseriesAdvances in electrical and electronic engineeringcs
dc.relation.urihttp://dx.doi.org/10.15598/aeee.v16i3.2749cs
dc.rights© Vysoká škola báňská - Technická univerzita Ostrava
dc.rightsAttribution-NoDerivatives 4.0 International*
dc.rights.accessopenAccesscs
dc.rights.urihttp://creativecommons.org/licenses/by-nd/4.0/*
dc.subjectCu2Ocs
dc.subjectelectrodeposition under lightcs
dc.subjecthydrogencs
dc.subjectXRDcs
dc.subjectwater splittingcs
dc.titlePotentiostatic electrodeposition of Cu2O under light and dark for photoelectrochemical hydrogen generation applicationscs
dc.typearticlecs
dc.type.statusPeer-reviewedcs
dc.type.versionpublishedVersioncs

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