Ellipsometric measurement methods in infrared range using phase modulation

Abstract

Spectroscopic infrared ellipsometry is an optical method intended for characterization of thin-film systems properties. The method combines the infrared spectroscopy and the ellipsometry. The main advantage of ellipsometry is the measurement of two spectrally tied ellipsometric angles \Psi and \Delta and use of these parameters for the determination of some characteristics of measured material, e.g. the refractive index. In this thesis there is introduced the description (theoretical and mathematical) of the ellipsometer system with photoelastic modulator and the calibration procedure of the set-up. The results of calibration parameters are presented.