Studium tenkých vrstev metodami optické reflektometrie a polarimetrie

Abstract

Spectral polarimetry and spectral reflectrometry are methods intended for measuring thick-ness of a SiO2 thin film on a Si substrate. For determining the thickness of the thin film by spectral polarimetry method the ratio between the spectral reflectance of p- and s-polarized components reflected from thin film on the substrate is used. Spectral reflectometry method uses reflection of light from a thin film on the substrate and reflection from the reference material at a normal incidence. The thesis presents a description of polarimetric and reflectometric set-up. The results of measuring thickness of the SiO2 thin film on the Si substrate for both methods are presented.