Zobrazit minimální záznam

dc.contributor.authorDadoria, Ajay Kumar
dc.contributor.authorKhare, Kavita
dc.contributor.authorGupta, Tarun Kumar
dc.contributor.authorSingh, R. P.
dc.date.accessioned2016-08-01T08:39:39Z
dc.date.available2016-08-01T08:39:39Z
dc.date.issued2016
dc.identifier.citationAdvances in electrical and electronic engineering. 2016, vol. 14, no. 1, p. 66-74 : ill.cs
dc.identifier.issn1336-1376
dc.identifier.issn1804-3119
dc.identifier.urihttp://hdl.handle.net/10084/111923
dc.description.abstractScaling of the MOSFET face greater challenge by extreme power density due to leakage current in ultra deep sub-micron (UDSM) technology. To overcome from this situation double gate device like FinFET is used which has excellent control over the thin silicon fins with two electrically coupled gate, which mitigate shorter channel effect and exponentially reduces the leakage current. In this research paper utilize the property of FinFET in domino logic, for high speed operation and reduction of power consumption in wide fan-in OR gate. Proposed circuit is simulated in FinFET technology by BISM4 model using HSPICE at 32nm process technology at 250C with CL=1pF at 100MHz frequency. For 8 and 16 input OR gate we save average power 11.5%,11.39% in SFLD, 22.97%, 18.12% in HSD, 30.90%, 34.57% in CKD in SG mode and for LP mode 11.26%, 15.78% in SFLD, 19.74%, 17.94% in HSD, 45.23%, 34.69% in CKD respectivelycs
dc.format.extent802178 bytes
dc.format.mimetypeapplication/pdf
dc.language.isoencs
dc.publisherVysoká škola báňská - Technická univerzita Ostravacs
dc.relation.ispartofseriesAdvances in electrical and electronic engineeringcs
dc.relation.urihttp://dx.doi.org/10.15598/aeee.v14i1.1538cs
dc.rights© Vysoká škola báňská - Technická univerzita Ostrava
dc.rightsCreative Commons Attribution 3.0 Unported (CC BY 3.0)
dc.rights.urihttp://creativecommons.org/licenses/by/4.0/
dc.subjectFinFETcs
dc.subjecthigh speedcs
dc.subjectmultigate devicecs
dc.subjectshort channel effectcs
dc.titleUltra low power high speed domino logic circuit by using FinFET technologycs
dc.typearticlecs
dc.identifier.doi10.15598/aeee.v14i1.1538
dc.rights.accessopenAccess
dc.type.versionpublishedVersioncs
dc.type.statusPeer-reviewedcs


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