Electron attachment properties of c-C4F8O in different environments
| dc.contributor.author | Chachereau, Alise | |
| dc.contributor.author | Fedor, Juraj | |
| dc.contributor.author | Janečková, Radmila | |
| dc.contributor.author | Kočišek, Jaroslav | |
| dc.contributor.author | Rabie, Mohamed | |
| dc.contributor.author | Franck, Christian M. | |
| dc.date.accessioned | 2016-11-01T07:48:57Z | |
| dc.date.available | 2016-11-01T07:48:57Z | |
| dc.date.issued | 2016 | |
| dc.description.abstract | The electron attachment properties of octafluorotetrahydrofuran (c-C4F8O) are investigated using two complementary experimental setups. The attachment and ionization cross sections of c-C4F8O are measured using an electron beam experiment. The effective ionization rate coefficient, electron drift velocity and electron diffusion coefficient in c-C4F8O diluted to concentrations lower than 0.6% in the buffer gases N2, CO2 and Ar, are measured using a pulsed Townsend experiment. A kinetic model is proposed, which combines the results of the two experiments. | cs |
| dc.description.firstpage | art. no. 375201 | cs |
| dc.description.issue | 37 | cs |
| dc.description.source | Web of Science | cs |
| dc.description.volume | 49 | cs |
| dc.identifier.citation | Journal of Physics D: Applied Physics. 2016, vol. 49, issue 37, art. no. 375201. | cs |
| dc.identifier.doi | 10.1088/0022-3727/49/37/375201 | |
| dc.identifier.issn | 0022-3727 | |
| dc.identifier.issn | 1361-6463 | |
| dc.identifier.uri | http://hdl.handle.net/10084/112202 | |
| dc.identifier.wos | 000384093000016 | |
| dc.language.iso | en | cs |
| dc.publisher | IOP Publishing | cs |
| dc.relation.ispartofseries | Journal of Physics D: Applied Physics | cs |
| dc.relation.uri | http://dx.doi.org/10.1088/0022-3727/49/37/375201 | cs |
| dc.rights | © 2016 IOP Publishing Ltd | cs |
| dc.subject | C4F8O | cs |
| dc.subject | octafluorotetrahydrofuran | cs |
| dc.subject | attachment cross section | cs |
| dc.subject | swarm parameters | cs |
| dc.subject | three-body attachment | cs |
| dc.title | Electron attachment properties of c-C4F8O in different environments | cs |
| dc.type | article | cs |
| dc.type.status | Peer-reviewed | cs |
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