Praparation and characterization of nickel silicide films

Abstract

This bachelor thesis deals with the preparation of nickel silicide layers on silicon carbide substrates by physical vapour deposition, specifically magnetron sputtering, and the effect of changing conditions on their properties. Furthermore, the layers were characterized by spectroscopic ellipsometry, using which models were proposed that attempt to describe the thickness and composition of the prepared layers. The models were parameterised using oscillators. The practical part with its results is presented after a theoretical introduction outlining the basic properties of silicon carbide and nickel silicides.