Mikrodefekty v monokrystalech Czochralskiho křemíku

Abstract

The diploma thesis is devoted to the study of microdefects in N-type Czochralski single-crystal silicon. Characterization of defects type and distribution was made using an optical microscope with differential interference contrast and scanning electron microscopy. This diploma thesis was created with the support of ON Semiconductor Czech Republic, Rožnov pod Radhošťem.

Description

Subject(s)

silicon wafer, microdefects, Voronkov theory

Citation