Application of Bernoulli process-based charts to electronic assembly

dc.contributor.authorNoskievičová, Darja
dc.contributor.authorJarošová, Eva
dc.contributor.authorBrodecká, Kateřina
dc.date.accessioned2016-11-18T08:46:46Z
dc.date.available2016-11-18T08:46:46Z
dc.date.issued2015
dc.description.abstractThe application of protective gel, which is a subprocess of the electronic assembly of the exhaust gas recirculation sensor, is a highly capable process with the fraction of nonconforming units as low as 200 ppm. Every unit is inspected immediately after gel application. The conventional Shewhart chart is of no use here, and the approach based on the Bernoulli process is therefore considered. The number of conforming items in a row until the occurrence of first or the r-th nonconforming is determined and CCC-r, CCC-r EWMA, and CCC CUSUM charts are applied. The aim of the control is to detect the process deterioration, and so the one-sided charts are used. So that the charts based on the geometric or negative binomial distribution can be compared, their performance is assessed through the average number of inspected units until a signal (ANOS). Our study confirmed that CCC-r EWMA and CCC CUSUM are able to detect the process shift more quickly than the CCC-r chart. Of the two charts, the first is easier to construct.cs
dc.description.firstpageart. no. 14cs
dc.description.sourceWeb of Sciencecs
dc.description.volume7cs
dc.format.extent835294 bytes
dc.format.mimetypeapplication/pdf
dc.identifier.citationInternational Journal of Engineering Business Management. 2015, vol. 7, art. no. 14.cs
dc.identifier.doi10.5772/60758
dc.identifier.issn1847-9790
dc.identifier.urihttp://hdl.handle.net/10084/116383
dc.identifier.wos000366195300001
dc.language.isoencs
dc.publisherIntechcs
dc.relation.ispartofseriesInternational Journal of Engineering Business Managementcs
dc.relation.urihttp://dx.doi.org/10.5772/60758cs
dc.rights© 2015 Author(s). Licensee InTech. This is an open access article distributed under the terms of the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.cs
dc.rights.accessopenAccess
dc.rights.urihttp://creativecommons.org/licenses/by/3.0/cs
dc.subjectCCC-rcs
dc.subjectCCC-CUSUMcs
dc.subjectCCC-r EWMAcs
dc.subjecthighly capable processcs
dc.subjectANOScs
dc.titleApplication of Bernoulli process-based charts to electronic assemblycs
dc.typearticlecs
dc.type.statusPeer-reviewedcs
dc.type.versionpublishedVersioncs

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